Optical emission spectroscopy as a process-monitoring tool in PECVD of amorphous carbon coatings
|Abstract:||The production of amorphous carbon coatings or as commonly known as diamond like carbon (DLC) coatings, using the plasma enhanced chemical vapor deposition (PECVD) method is studied through optical emission spectroscopy (OES) as a plasma diagnostic technique and the partial least square regression (PLSR) statistical method. The objective is to establish a model to predict DLC properties independent of reactor-related parameters, in order to be used in any other similar deposition process. Therefore the model correlates the deposited coating properties to plasma parameters derived from OES. The OES derived data carries a variety of information about plasma characteristics. The relative spectral line intensities of CH and atomic H to specific Ar lines were employed as a probe of their concentrations according to actinometry method. The full width at half maximum of atomic H was also employed. This method can be used as a probe of gas temperature via Doppler broadening effect. The DLC coatings were characterized using profilometry for thickness and stress measurements and Auger electron spectroscopy (AES) for structural analysis. There were two series of PLSR analysis carried out: The first analysis studies the correlation between process parameters and plasma characteristics, as derived by OES, for a better understanding of the plasma deposition process. The second analysis shows how the OES can be used for prediction of coating properties and for process monitoring. According to the results, the OES data (especially the parameters that are related to the concentration of atomic hydrogen and CH species) are able to represent some parts of process parameters (plasma power, mode and pressure) in a statistical model that is designed for predicting DLC coating properties. In other words, this means that this plasma diagnostic technique can be employed for in-situ monitoring of growing DLC coating properties, instead of using process parameters, which are related to the deposition reactor and may vary from one system to another. The perspective of using the OES data and the PLSR analysis in designing and monitoring a structurally gradient DLC coating is also discussed.|
|Document Type:||Mémoire de maîtrise|
|Open Access Date:||24 April 2018|
|Collection:||Thèses et mémoires|
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