Publication :
Sulfur-rich chalcogenide claddings for athermal and high-Q silicon microring resonators

ali.license-refhttps://creativecommons.org/licenses/by/4.0fr
ali.license-ref.start-date2021-02-26fr
bul.description.provenanceelcou28 chlacfr
bul.rights.dateAccepPubl2021-02-26fr
bul.rights.periodeEmbargoP0Mfr
bul.rights.typeDatedatePublicationfr
dc.contributor.authorJean, Philippe
dc.contributor.authorLaRochelle, Sophie
dc.contributor.authorThibault, Tristan
dc.contributor.authorShi, Wei
dc.contributor.authorMessaddeq, Younès
dc.contributor.authorDouaud, Alexandre
dc.date.accessioned2021-04-16T16:05:16Z
dc.date.available2021-04-16T16:05:16Z
dc.date.issued2021-02-26
dc.description.abstractHeterogeneous integration of materials with a negative thermo-optic coefficient is a simple and efficient way to compensate the strong detrimental thermal dependence of silicon-on-insulator devices. Yet, the list of materials that are both amenable for photonics fabrication and exhibit a negative TOC is very short and often requires sacrificing loss performance. In this work, we demonstrate that As20S80 chalcogenide glass thin-films can be used to compensate silicon thermal effects in microring resonators while retaining excellent loss figures. We present an experimental characterization of the glass thin-film and of fabricated hybrid microring resonators at telecommunication wavelengths. Nearly athermal operation is demonstrated for the TM polarization with an absolute minimum measured resonance shift of 5.25 pm K−1, corresponding to a waveguide effective index thermal dependence of 4.28×10-6 RIU/K. We show that the thermal dependence can be controlled by changing the cladding thickness and a negative thermal dependence is obtained for the TM polarization. All configurations exhibit unprecedented low loss figures with a maximum measured intrinsic quality factor exceeding 3.9 × 105, corresponding to waveguide propagation loss of 1.37 dB cm−1. A value of−4.75(75)×10-5 RIU/K is measured for the thermo-optic coefficient of As20S80 thin-films.fr
dc.identifier.doi10.1364/OME.421814fr
dc.identifier.issn2159-3930fr
dc.identifier.urihttp://hdl.handle.net/20.500.11794/68800
dc.languageengfr
dc.publisherOSA Pub.fr
dc.rightshttp://purl.org/coar/access_right/c_abf2
dc.subject.rvmMicrorésonateurs en anneaufr
dc.subject.rvmSilicium sur isolantfr
dc.subject.rvmCouches minces -- Propriétés optiquesfr
dc.subject.rvmChalcogénuresfr
dc.titleSulfur-rich chalcogenide claddings for athermal and high-Q silicon microring resonatorsfr
dc.typearticle de recherche
dc.type.legacyCOAR1_1::Texte::Périodique::Revue::Contribution à un journal::Article::Article de recherchefr
dcterms.bibliographicCitationOptical materials express, Vol. 11 (3), 913-925 (2021)fr
dspace.accessstatus.time2023-01-26 18:00:35
dspace.entity.typePublication
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rioxxterms.projectSTPGP 494358-16fr
rioxxterms.project.funder-nameNatural Sciences and Engineering Research Council of Canadafr
rioxxterms.versionVoRfr
rioxxterms.version-of-recordhttps://doi.org/10.1364/OME.421814fr
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