Personne :
Thibault, Tristan

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Thibault
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Tristan
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Université Laval. Département de physique, de génie physique et d'optique
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ncf13678635
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  • Publication
    Accès libre
    Sulfur-rich chalcogenide claddings for athermal and high-Q silicon microring resonators
    (OSA Pub., 2021-02-26) Jean, Philippe; LaRochelle, Sophie; Thibault, Tristan; Shi, Wei; Messaddeq, Younès; Douaud, Alexandre
    Heterogeneous integration of materials with a negative thermo-optic coefficient is a simple and efficient way to compensate the strong detrimental thermal dependence of silicon-on-insulator devices. Yet, the list of materials that are both amenable for photonics fabrication and exhibit a negative TOC is very short and often requires sacrificing loss performance. In this work, we demonstrate that As20S80 chalcogenide glass thin-films can be used to compensate silicon thermal effects in microring resonators while retaining excellent loss figures. We present an experimental characterization of the glass thin-film and of fabricated hybrid microring resonators at telecommunication wavelengths. Nearly athermal operation is demonstrated for the TM polarization with an absolute minimum measured resonance shift of 5.25 pm K−1, corresponding to a waveguide effective index thermal dependence of 4.28×10-6 RIU/K. We show that the thermal dependence can be controlled by changing the cladding thickness and a negative thermal dependence is obtained for the TM polarization. All configurations exhibit unprecedented low loss figures with a maximum measured intrinsic quality factor exceeding 3.9 × 105, corresponding to waveguide propagation loss of 1.37 dB cm−1. A value of−4.75(75)×10-5 RIU/K is measured for the thermo-optic coefficient of As20S80 thin-films.