Personne :
Mantovani, D.

Photo de profil
Adresse électronique
Date de naissance
Projets de recherche
Structures organisationnelles
Fonction
Nom de famille
Mantovani
Prénom
D.
Affiliation
Université Laval. Département de génie des mines, de la métallurgie et des matériaux
ISNI
ORCID
Identifiant Canadiana
ncf10497704
person.page.name

Filtres

20181
1
1
1
Réinitialiser les filtres

Paramètres

Auteur: Anooshehpour, Farid ×

Résultats de recherche

Voici les éléments 1 - 1 sur 1
  • Publication
    Accès libre
    Optical emission spectroscopy as a process-monitoring tool in plasma enhanced chemical vapor deposition of amorphous carbon coatings - multivariate statistical modelling
    (Elsevier Science, 2018-03-01) Turgeon, Stéphane; Anooshehpour, Farid; Laroche, Gaétan; Mantovani, D.; Cloutier, Maxime
    Production of Diamond-Like Carbon (DLC) nanocoatings using plasma enhanced chemical vapor deposition is studied by Optical Emission Spectroscopy (OES) as a plasma diagnostic technique. The objective of the current research is to establish a predictive model of DLC properties using a multivariate analysis method. This model is based on OES data instead of process parameters, which are reactor dependent and accordingly, their effect on the plasma deposition process may vary from one reactor to another. The predictive potential of OES is evaluated using partial least square regression (PLSR) analysis. The results show that OES derived data are capable of replacing some process parameters to predict the DLC properties. The perspective of PLSR modelling and OES application for the development and monitoring of a structurally graded DLC coating is also discussed.