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Personne :
Laroche, Gaétan

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Laroche

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Gaétan

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Université Laval. Département de génie des mines, de la métallurgie et des matériaux

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ncf10316941

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Voici les éléments 1 - 3 sur 3
  • PublicationAccès libre
    Deposition of anti-fog coatings on glass substrates using the jet of an open-to-air microwave argon plasma at atmospheric pressure
    (Wiley-VCH-Verl., 2020-04-22) Durocher-Jean, Antoine; Rodríguez Durán, Iván; Asadollahi, Siavash; Laroche, Gaétan; Stafford, Luc
    This study reports a one-step process for the formation of anti-fog coatings on commercial glass substrates using the jet of an open-to-air microwave argon plasma at atmospheric pressure with hexamethyldisiloxane (HMDSO) as the precursor for plasma-enhanced chemical vapor deposition. Optical microscopy and broadband light transmittance measurements revealed significant precursor fragmentation and gas phase association reactions when HMDSO was injected close to the tube outlet, resulting in powder-like, hydrophobic, and semiopaque glass surfaces. On the contrary, injection of HMDSO close to the substrate led to smoother, homogeneous, hydrophilic, and transparent glass surfaces. In addition, transmittance measurements at 590 nm in humid air according to American Society for Testing and Materials standard tests revealed superior antifogging properties to plasma-treated glass substrates. On the basis of the optical emission and absorption spectroscopy measurements, electrons, metastable argon atoms, and hot neutral argon atoms were mostly responsible for the significant precursor fragmentation close to the tube outlet, whereas the contribution of hot neutrals and ultraviolet photons became important close to the substrate.
  • PublicationAccès libre
    Influence of a square pulse voltage on argon-ethyl lactate discharges and their plasma-deposited coatings using time-resolved spectroscopy and surface characterization
    (AIP Publishing, 2018-10-15) Laroche, Gaétan; Desjardins, Edouard; Naudé, Nicolas; Meichelboeck, Maximilian; Belinger, Antoine; Laurent, Morgane; Stafford, Luc; Gherardi, Nicolas
    By comparing time-resolved optical emission spectroscopy measurements and the predictions of a collisional-radiative model, the evolutions of electron temperature (Te) and number density of argon metastable atoms [n(Arm)] were determined in argon-ethyl lactate dielectric barrier discharges. The influence of a square pulse power supply on Te, n(Arm), and discharge current is evaluated and correlated with the chemistry and the topography of plasma-deposited coatings. Pulsed discharges were found to have shorter (100 ns) but stronger (1 A) current peaks and higher electron temperatures (0.7 eV) than when using a 35 kHz sinusoidal power supply (2 μs, 30 mA, 0.3 eV). The n(Arm) values seemed to be rather stable around 1011 cm−3 with a sinus power supply. In contrast, with a pulse power supply with long time off (i.e., time without discharge) between each pulse, a progressive increase in n(Arm) from 1011 cm−3 up to 1012–1013 cm−3 was observed. When the time off was reduced, this increase was measured in sync with the current peak. The chemical composition of the coatings was not significantly affected by using a pulse signal, whereas the topography was strongly influenced and led to powder formations when reducing the time off.
  • PublicationAccès libre
    Characterization of argon dielectric barrier discharges applied to ethyl lactate plasma polymerization
    (Institute of Physics Publishing Ltd, 2017-11-03) Laroche, Gaétan; Desjardins, Edouard; Naudé, Nicolas; Meichelboeck, Maximilian; Laurent, Morgane; Stafford, Luc; Gherardi, Nicolas
    The influence of the input voltage frequency (35 and 150 kHz), interelectrode gap (1 and 2 mm) and precursor concentration (250, 350, and 450 ppm) on the electron temperature (Te), number density of metastable Ar atoms (n(Arm)), and discharge current density (proportional to the electron density ne) is studied in an argon-ethyl lactate dielectric barrier discharge (DBD). An argon-ammonia Penning mixture is also considered as reference. These results are correlated to the chemistry (XPS, IR) and topography (AFM) of the ethyl-lactate-based plasma polymer coatings. Low Te values from 0.3 to 0.5 eV were obtained for all discharges. This observation, in addition to resemblances with the Ar–NH3 mixture, suggested that the ionization kinetics of ethyl lactate-based discharges is driven by Penning reactions. Among the investigated parameters, the dissipated power obtained through changes of the excitation frequency had the largest impact on both the coatings properties and the discharge behavior.